01453nas a2200109   4500008004100000022001400041245014700055210006900202300001100271520098900282856007201271       2026                        eng d  a0169-433200aOxidation resistance of organosilicon layered nanostructures synthesized by nonthermal plasma and plasma silica as a source of oxidizing agent0 aOxidation resistance of organosilicon layered nanostructures syn  a1649723 a<p>Plasma polymer (1.2 g cm−3), compact silicon carbide (2.1 g cm−3) and plasma silica (2.2 g cm−3) were synthesized from pure tetravinylsilane vapor or its mixture with argon or oxygen by plasma-enhanced chemical vapor deposition. These materials in the form of nanolayers were combined into layered nanostructures deposited on silicon wafers. XPS depth profiling was used to analyze the chemical depth profiles across the layered nanostructures. The oxidation resistance of highly cross-linked silicon carbide and plasma silica was confirmed after 18 months of storage. However, the plasma polymer with low oxidation resistance must be protected by a 5-nm thick compact silicon carbide barrier to prevent its oxidation. Plasma silica was identified as the source of oxidizing agent for the adjacent plasma polymer in the silica/polymer nanostructure protected by a barrier against the surrounding environment. Oxygen penetrated the polymer by 37 nm in two years.</p>  uhttps://www.sciencedirect.com/science/article/pii/S016943322502688100354nas a2200097   4500008004100000245006200041210006200103300001600165490000700181856006800188       2023                        eng d00aCold damping of levitated optically coupled nanoparticles0 aCold damping of levitated optically coupled nanoparticles  a1203–12090 v10  uhttps://opg.optica.org/optica/abstract.cfm?URI=optica-10-9-1203