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Filtry: Autor je Arregi, Jon Ander and Klíčové Slovo is AIF  [Clear All Filters]
2025
Silhan L, Arregi JAnder, Plichta T, Vaculik O, Novotny J, Šerý M. Compact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring. Journal of Vacuum Science & Technology B, 43, 034202 (2025).