Design and manufacturing of advanced diffractive optical elements and their application to the industry

Main aims of submitted project are the following: 1. Realization of reticle using diffractive amplitude or phase element for the visible spectrum range. Design of diffractive structures for one or more specific wavelengths and their fabrication by techniques of electron beam lithography. Optical and structural control of fabricated elements. 2. Development and realization of glass mask substrate for replicated production of reticles with sub-micrometer lateral and height dimensions for technique of optical Nanolmprint lithography. Design of hard stable form for imprint of diffractive structure into the photoresist. Structural control of profile, optical and quality control of fabricated structures. 3. Development and realization of diffractive optical element for generation of Bessel shape beams with required suppresion of distribution of energy to the secondary minima (principally corresponds to Axicon with the emphasis on preventing side minima). Design and calculation of diffractive structures and their fabrication by electron beam lithography technique. Optical and structural control of fabricated elements. 4. Development and realization of diffractive optical element for transformation of Gaussian shape laser beam to TopHat form and multiple flat beam splitter. Design and calculation of diffractive structures and their fabrication by technique of electron beam lithography. Optical and structural control of fabricated elements.